In order to provide you with a better browsing experience and to improve our site functionality, we use cookies and other tracking technologies. Detailed information on the use of cookies on our site and how to opt out is provided in our Cookie Policy. By clicking on "AGREE" button below or clicking into any content on this site, you consent that we can store and access cookies and other tracking technologies as described in our Cookie Policy.

ISS (Irradiation Side Sampling) method

Fujifilm's new proprietary technology “ISS method*” FPD

The “ISS method” provides highly sharp images even with low dose

[Diagram] FUJIFILM's new proprietary technology “ISS method” FPD

The main characteristic of Fujifilm's new proprietary technology “ISS method” is the placing of the TFT sensor on the front side of the scintillation layer whereas the TFT sensor of existing panels is located on the back side. By using this new method, the scattering/reduction of X-ray signals is significantly reduced (resulting in improved MTF). Also, optimization of the scintillation layer of the panel is achieved by Fujifilm's own precision coating technology cultivated by its vast experience in the manufacturing of Imaging Plates (IP), resulting in improved DQE.

Note

  • * Irradiation Side Sampling